Abstract

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Copper doped tin oxide thin film was synthesised by electrodeposition technique. Film growth was maintained at cathodic potential of 1.60 V at a varied deposition time. Surface morphological studies of the deposited films were achieved by field emission scanning electron microscopy (FE-SEM). The scanning electron microscopy image revealed evenly distributed films, across the substrate with rice-like or dome-like particles, depending on the deposition time. Post-annealing enhanced films crystallinity and particles agglomeration. Energy disperse X-ray spectra revealed the elemental constituents present in the film. The results obtained from electrical characterisation of the samples showed the ohmic properties of the deposited sample. X-ray diffraction results indicated that samples are polycrystalline in nature with tetragonal rutile structure. The average interplanar spacing and crystallite size of the samples were estimated as 2.93 Å and 202.5 Å respectively. Optical characterisation of the samples showed that absorption and transmittance across the ultraviolet-visible spectrum range depend on deposition time. The estimated energy band gaps of 3.06 eV suggested the films as good candidates for transparent contact electrodes in optoelectronic applications.

Keywords: Electrodeposition, Annealing, Doping, Crystallinity, Morphology, Energy band gap